Comparable study on the effect of diluted NH 4 Cl solution on the postdeposition surface texture of as-deposited aluminum-doped zinc oxide films by direct current pulse and direct current reactive magnetron sputtering

Applied Surface Science

Volumn 255, Issue 16, 2009, Pages 7268-7272

  Gao, Xiaoyong ^a   Lin, Qinggeng ^a   Feng, Hongliang ^a   Chen, Yongsheng ^a   Yang, Shie ^a   Gu, Jinhua ^a   Li, Weiqiang ^a   Lu, Jingxiao ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

AZO film; Magnetron sputtering; NH 4 Cl aqueous solution; Surface texture

Indexed keywords

ALUMINUM OXIDE; CHLORINE COMPOUNDS; DOPING (ADDITIVES); ETCHING; GRAIN BOUNDARIES; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; OPTICAL FILMS; SOLUTIONS; TRANSPARENT CONDUCTING OXIDES; ZINC OXIDE;

ALUMINUM DOPED ZINC OXIDE FILMS; ALUMINUM-DOPED ZINC OXIDE; AZO FILMS; DIRECT CURRENT; ETCHING TREATMENT; POST-DEPOSITION; REACTIVE MAGNETRON SPUTTERING; SURFACE TEXTURES;

ALUMINUM COATINGS;

EID: 67349203868     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.03.080     Document Type: Article

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