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Volumn 479, Issue 1-2, 2009, Pages 583-588
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Non-destructive characterization of In/Ag and In/Cu diffusive layers
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Author keywords
Dielectric function; Interdiffusion in nanoscale solids; Intermetallic compounds; Scanning electron microscopy; Spectroscopic ellipsometry; X ray diffractometry
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Indexed keywords
ATOMIC CONCENTRATIONS;
COMPLEX DIELECTRIC FUNCTIONS;
COMPOSITE LAYERS;
DIELECTRIC FUNCTION;
DRUDE-LORENTZ MODELS;
ELLIPSOMETRIC DATUM;
INTERDIFFUSION IN NANOSCALE SOLIDS;
INTERMETALLIC COMPOUNDS;
MICRO-STRUCTURAL;
NON-DESTRUCTIVE CHARACTERIZATIONS;
OPTICAL AND ELECTRONIC PROPERTIES;
OPTICAL RESISTIVITIES;
PHOTON ENERGY RANGES;
ROOM TEMPERATURES;
SAMPLE COMPOSITIONS;
X-RAY DIFFRACTOMETRY;
COPPER;
DIFFRACTION;
DIFFRACTOMETERS;
ELECTRON MICROSCOPES;
ELECTRONIC PROPERTIES;
MULTILAYERS;
NANOSTRUCTURED MATERIALS;
OPTICAL MICROSCOPY;
OPTICAL MULTILAYERS;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING INTERMETALLICS;
SILVER;
SPECTROSCOPIC ELLIPSOMETRY;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
INTEGRATED OPTOELECTRONICS;
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EID: 67349196045
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2009.01.002 Document Type: Article |
Times cited : (5)
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References (37)
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