Sub-10 nm silicon ridge nanofabrication by advanced edge lithography for NIL applications

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 832-835

  Zhao, Yiping ^a   Berenschot, Erwin ^a   Jansen, Henri ^a   Tas, Niels ^a   Huskens, Jurriaan ^a   Elwenspoek, Miko ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Edge lithography; Nanoimprint lithography; Silicon ridge nano fabrication

Indexed keywords

CONVENTIONAL PHOTOLITHOGRAPHIES; DEVICE WAFERS; EDGE LITHOGRAPHY; LOCAL OXIDATION OF SILICONS; POLYMETHYLMETHACRYLATE; SINGLE CRYSTALLINE SILICONS; THERMAL NANOIMPRINT LITHOGRAPHIES; WAFER SIZES;

FABRICATION; NONMETALS; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SILICON WAFERS;

NANOIMPRINT LITHOGRAPHY;

EID: 67349158258     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.067     Document Type: Article

References (22)

1. Gates B.D., Xu Q., Steward M., Ryan D., Willson C.G., and Whitesides G.M. New approaches to nanofabrication: molding printing and other techniques. Chem. Rev. 105 (2005) p. 1171
2. H.V. Jansen, N.R. Tas, J.W. Berenschot, MEMS-based nanotechnology in Encyclopedia of Nanoscience and Nanotechnology 5, in: H.S. Nalwa (Ed.), 2004, p. 163.
3. Chou S.Y., and Renstrom P.J. Imprint of sub-25 nm vias and trenches in polymer. Appl. Phys. Lett. 67 (1995) 114-3116
4. Resnick D.J., Sreenivasan S.V., and Willson C.G. Step and flash imprint lithography. Mater Today 8 (2005) p. 34
5. Dean R.H., and Matarese R.J. Submicrometer self-aligned dual-gate GaAs FET. IEEE Trans. Elec. Dev. 22 (1975) p. 358
6. Jelks E.C., Kerber G.L., and Wilcox H.A. A simple method for fabricating lines of 0.15 μ width using optical lithography. Appl. Phys. Lett. 34 (1979) p. 28
7. Flanders D.C. X-ray lithography at ∼100 Å linewidths using X-ray masks fabricated by shadowing techniques. J. Vac. Sci. Technol. 16 (1980) p. 1615
8. Prober D.E., Feuer M.D., and Giordano N. Fabrication of 300 Å metal lines with substrate-step techniques. Appl. Phys. Lett. 37 (1980) p. 94
9. Flanders D.C., and White A.E. Application of ≈100 Å linewidth structures fabricated by shadowing techniques. J. Vac. Sci. Technol. 19 (1981) p. 892
10. Flanders D.C., and Efremow N.N. Generation of less than 50 nm period gratings using edge defined techniques. J. Vac. Sci. Technol. B 1 (1983) p.1105
11. Love J.C., Paul K.E., and Whitesides G.M. Fabrication of nanometer-scale features by controlled isotropic wet chemical etching. Adv. Mater. 13 (2001) p. 604
12. Tas N.R., Berenschot J.W., Mela P., Jansen H.V., Elwenspoek M., and van den Berg A. 2D-confined nanochannels fabricated by conventional micromachining. Nano. Lett. 2 (2002) p. 1031
13. Choi Y.-K., Zhu J., Grunes J., Bokor J., and Somorjai G.A. Fabrication of sub-10 nm silicon nanowire arrays by size reduction lithography. J. Phys. Chem. B 107 (2003) p. 3340
14. Kwon S., Yan X., Contreras A.M., Liddle J.A., Somorjai G.A., and Bokor J. Fabrication of metallic nanodots in large-area arrays by mold-to-mold cross imprinting (MTMCI). Nano. Lett. 5 (2005) p. 2557
15. Grabiec P.B., Zaborowski M., Domanski K., Gotszalk T., and Rangelow I.W. Nano-width lines using lateral pattern definition technique for nanoimprint template fabrication. Microelec. Eng. 73-74 (2004) p. 599
16. Haneveld J., Berenschot E., Maury P., and Jansen H. Nano-ridge fabrication by local oxidation of silicon edges with silicon nitride as a mask. J. Micromech. Microeng. 16 (2006) p. S24
17. Haneveld J., Jansen H., Berenschot E., Tas N., and Elwenspoek M. Wet anisotropic etching for fluidic 1D nanochannels. J. Micromech. Microeng. 13 (2003) p. S62
18. Zhao Y., Berenschot E., de Boer M., Jansen H., Tas N., Huskens J., and Elwenspoek M. Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography. J. Micromech. Microeng. 18 (2008) p. 064013
19. C.M. Bruinink, unpublished results.
20. Srinivasan U., Houston M.R., Howe R.T., and Maboudian R. Alkyltrichlorosilane-based self-assembled monolayer films for stiction reduction in silicon micromachines. MEMS 7 2 (1998) p. 252
21. Micro Resist Technology GmbH, Thermoplastic polymer for nanoimprint lithography processing guideline: mr-I 7000E.
22. H.V. Jansen, M.J. de Boer, S. Unnikrishnan, M.C. Louwerse, M.C. Elwenspoek, Black silicon method X: A Review on high speed and selective plasma etching of silicon with profile control, An in-depth comparison between Bosch and Cryostat DRIE processes as a roadmap to next generation equipment, accepted for publication in J Micrometch. Microeng., to be published in 2008.