Structure and internal stress of tin-doped indium oxide and indium-zinc oxide films deposited by DC magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 12, 2007, Pages 7806-7811

  Nishimura, Eriko ^a,b   Sasabayashi, Tomoko ^a   Ito, Norihiro ^a   Sato, Yasushi ^a   Utsumi, Kentaro ^c   Yano, Koki ^d   Kaijo, Akira ^d   Inoue, Kazuyoshi ^d   Shigesato, Yuzo ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b TOSHIBA CORPORATION   (Japan)

^c TOSOH CORPORATION   (Japan)

^d IDEMITSU KOSAN CO LTD   (Japan)

Author keywords

dc magnetron sputtering; Indium zinc oxide (IZO); Internal stress; Tin doped indium oxide (ITO); Transparent conductive oxide (TCO)

Indexed keywords

COMPRESSIVE STRESS; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; TIN COMPOUNDS;

INDIUM-ZINC OXIDE (IZO); INTERNAL STRESS; TIN-DOPED INDIUM OXIDE (ITO); TRANSPARENT CONDUCTIVE OXIDE (TCO);

THIN FILMS;

EID: 37549035884     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.7806     Document Type: Article

References (18)

1. T. Sasabayashi, N. Ito, E. Nishimura, M. Kon, P. K. Song, K. Utsumi, A. Kaijo, and Y. Shigesato: Thin Solid Films 445 (2003) 219.
2. T. Sasabayashi, P. K. Song, Y. Shigesato, K. Utsumi, A. Kaijo, and A. Mitsui: Mater. Res. Soc. Symp. Proc. 666 (2001) F2.4.1.
3. R. Latz, K. Michael, and M. Scherer: Jpn. J. Appl. Phys. 30 (1991) L149.
4. I. Hamberg and C. G. Granqvist: J. Appl. Phys. 60 (1986) R123.
5. Y. Shigesato, Y. Hayashi, and T. Haranoh: Appl. Phys. Lett. 61 (1992) 73.
6. Y. Shigesato and D. C. Paine: Appl. Phys. Lett. 62 (1993) 1268.
7. N. Ito, Y. Sato, P. K. Song, A. Kaijo, K. Inoue, and Y. Shigesato: Thin Solid Films 496 (2006) 99.
8. A. Kaijo, K. Inoue, S. Matsuzaki, and Y. Shigesato: Proc. 4th Pacific Rim Int. Conf. Advanced Materials and Processing (PRICM-4), 2001, p. 1787.
9. P. K. Song, Y. Shigesato, I. Yasui, C. W. Ow-Yang, and D. C. Paine: Jpn. J. Appl. Phys. 37 (1998) 1870.
10. P. K. Song, Y. Shigesato, M. Kamei, and I. Yasui: Jpn. J. Appl. Phys. 38 (1999) 2921.
11. K. Meyer, I. K. Schuller, and C. M. Falco: J. Appl. Phys. 52 (1981) 5803.
12. R. S. Robinson: J. Vac. Sci. Technol. 16 (1979) 185.
13. T. Motohiro: J. Vac. Sci. Technol. A 4 (1986) 189.
14. J. A. Thornton and D. W. Hoffman: Thin Solid Films 171 (1989) 5.
15. P. K. Song, H. Akao, M. Kamei, Y. Shigesato, and I. Yasui: Jpn. J. Appl. Phys. 38 (1999) 5224.
16. Y. Shigesato, S. Takaki, and T. Haranoh: J. Appl. Phys. 71 (1992) 3356.
17. Y. Shigesato, S. Takaki, and T. Haranoh: Appl. Surf. Sci. 48-49 (1991) 269.
18. Y. Shigesato, D. C. Paine, and T. E. Haynes: J. Appl. Phys. 73 (1993) 3805.