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Volumn 482, Issue 1-2, 2009, Pages 33-42

Copper passivation by metal doping

Author keywords

Atomic scale structure; Computer simulations; Corrosion; Gas solid reactions; Transition metal alloys and compounds

Indexed keywords

ATOMIC OXYGEN; ATOMIC SCALE STRUCTURE; COMPUTATIONAL DENSITY; COPPER SURFACE; CU(1 0 0); CU(1 1 0); CU(1 1 1); DENSE SURFACE; DOPANT ATOMS; DOPANT METALS; GAS-SOLID REACTIONS; METAL-DOPED; METAL-DOPING; PASSIVATING LAYER; PASSIVATION POTENTIALS; SEGREGATION ENERGIES; SUB-SURFACE; SURFACE LAYERS; SURFACE ORIENTATION; TRANSITION METAL ALLOYS AND COMPOUNDS;

EID: 67349109909     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.03.180     Document Type: Article
Times cited : (13)

References (79)
  • 6
    • 63049111168 scopus 로고    scopus 로고
    • A.P. Boeira, I.L. Ferreira, A. Garcia, J. Mater. Des. (2008) doi:10.1016/j.matdes.2008.08.032.
    • A.P. Boeira, I.L. Ferreira, A. Garcia, J. Mater. Des. (2008) doi:10.1016/j.matdes.2008.08.032.
  • 28
    • 67349255476 scopus 로고    scopus 로고
    • Y.W. Lee, M. Metzger, J.M. Rigsbee, USACERL Technical Report (TR) FM-93/16.
    • Y.W. Lee, M. Metzger, J.M. Rigsbee, USACERL Technical Report (TR) FM-93/16.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.