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Volumn 105, Issue 9, 2009, Pages

Radiation damage to amorphous carbon thin films irradiated by multiple 46.9 nm laser shots below the single-shot damage threshold

(8) Juha, L a Hajkova V a Chalupsk, J a,b Vorlicek V a Ritucci, A c Reale, A c Zuppella, P c Stormer M d

a INSTITUTE OF PHYSICS (Czech Republic)

b CZECH TECHNICAL UNIVERSITY IN PRAGUE (Czech Republic)

c UNIVERSITY OF L'AQUILA (Italy)

d INSTITUTE OF MATERIALS RESEARCH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AMORPHOUS CARBON (A-C); AMORPHOUS CARBON THIN FILMS; BEAM SPOT; CAPILLARY DISCHARGE LASERS; CAPILLARY-DISCHARGE; DAMAGE THRESHOLD; DAMAGED AREA; DIFFERENTIAL INTERFERENCE CONTRAST; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET LASERS; FEMTOSECOND PULSE; FLUENCE; FOCUSED BEAMS; GAUSSIAN PROFILES; HIGH ORDER HARMONICS; LASER SHOTS; LASER WAVELENGTH; LASER-PULSE ENERGY; MATERIAL EXPANSION; MULTI-LAYER MIRRORS; NE-LIKE; PULSE DURATIONS; PULSE ENERGIES; RAMAN MICROPROBE ANALYSIS; SAMPLE SURFACE; SILICON SUBSTRATES; SINGLE-SHOT; THIN LAYERS;

AMORPHOUS CARBON; AMORPHOUS FILMS; AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; CARBON FILMS; ELECTROMAGNETIC PULSE; FILM PREPARATION; GAUSSIAN BEAMS; LASER PULSES; LASERS; MIRRORS; NEON; OPTICAL COATINGS; OPTICAL MICROSCOPY; PLASMAS; SURFACES; ULTRAVIOLET DEVICES;

PULSED LASER APPLICATIONS;

EID: 67249135722 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3117515 Document Type: Article

Times cited : (27)

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