Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses

Optics Letters

Volumn 29, Issue 6, 2004, Pages 620-622

  Grisham, M ^a   Vaschenko, G ^a   Menoni, C S ^a   Rocca, J J ^a   Pershyn, Yu P ^b   Zubarev, E N ^b   Voronov, D L ^b   Sevryukova, V A ^b   Kondratenko, V V ^b   Vinogradov, A V ^c   Artioukov, I A ^c  

^a Engineering Research Center and Hydraulics Laboratory   (United States)

^b NATIONAL TECHNICAL UNIVERSITY   (Ukraine)

^c LEBEDEV PHYSICAL INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS; INTERDIFFUSION (SOLIDS); LASER BEAMS; LASER PULSES; MIRRORS; MULTILAYERS; SCANDIUM; SCANNING ELECTRON MICROSCOPY; SILICON; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

DAMAGE MECHANISM; MULTILAYER MIRRORS;

OPTICAL COATINGS;

EID: 12144290898     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.29.000620     Document Type: Article

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