Non-thermal desorption/ablation of molecular solids induced by ultra-short soft x-ray pulses

Optics Express

Volumn 17, Issue 1, 2009, Pages 208-217

  Chalupsky J ^a,b   Juna, L ^a   Hajkova V ^a   Cihelka, J ^a   Vysin L ^a,b   Gautier, J ^c   Hajdu, J ^f   Hau Riege, S P ^g   Jurek, M ^e   Krzywinski, J ^e   London, R A ^g   Papalazarou, E ^c   Pelka, J B ^e   Rey, G ^c   Sebban, S ^c   Sobierajski, R ^e   Stojanovic, N ^d   Tiedtke, K ^d   Toleikis, S ^d   Tschentscher, T ^d   Valentin, C ^c   Wabnitz, H ^d   Zeitoun, P ^c   more..

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

^c LABORATOIRE D OPTIQUE APPLIQUÉE   (France)

^d DESY   (Germany)

^e INSTITUTE OF PHYSICS   (Poland)

^f UPPSALA UNIVERSITY   (Sweden)

^g LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; ATOMIC FORCE MICROSCOPY; ELECTRONS; ESTERS; FREE ELECTRON LASERS; RADIATION HARDENING; THERMAL DESORPTION; X RAY LASERS;

ABLATION THRESHOLDS; BEAM PROFILE MEASUREMENTS; HIGH ORDER HARMONICS; INTERMEDIATE REGIMES; POLY(METHYL METHACRYLATE) (PMMA); SOFT X RAY PULSE; SOFT X-RAY LASER; SURFACE HARDENING;

DESORPTION;

BORON DERIVATIVE; CARBON; POLY(METHYL METHACRYLATE);

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRON; LASER; LOW LEVEL LASER THERAPY; METHODOLOGY; RADIATION EXPOSURE; SPECTROPHOTOMETRY; SURFACE PROPERTY; ULTRAVIOLET RADIATION; X RAY;

BORON COMPOUNDS; CARBON; ELECTRONS; LASER THERAPY; LASERS; MICROSCOPY, ATOMIC FORCE; POLYMETHYL METHACRYLATE; SPECTROPHOTOMETRY; SURFACE PROPERTIES; ULTRAVIOLET RAYS; X-RAYS;

EID: 58449101606     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.000208     Document Type: Article

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