Total reflection amorphous carbon mirrors for vacuum ultraviolet free electron lasers

Applied Physics Letters

Volumn 84, Issue 5, 2004, Pages 657-659

  Steeg, B ^a   Juha, L ^a,g   Feldhaus, J ^a   Jacobi, S ^b   Sobierajski, R ^c   Michaelsen, C ^d   Andrejczuk, A ^e   Krzywinski, J ^f  

^a DESY   (Germany)

^b INSTITUTE OF MATERIALS RESEARCH   (Germany)

^c WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^d Incoatec GmbH ^*  (Germany)

^e UNIVERSITY OF BIALYSTOK   (Poland)

^f INSTITUTE OF PHYSICS   (Poland)

^g INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; COATINGS; COMPUTER SIMULATION; DIAMONDS; FULLERENES; GRAPHITE; MIRRORS; PHOTONS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; THIN FILMS; ULTRAHIGH VACUUM; ULTRAVIOLET RADIATION;

FULL WIDTH AT HALF MAXIMUM (FWHM); VACUUM ULTRAVIOLET (VUV);

FREE ELECTRON LASERS;

EID: 1342347382     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1645320     Document Type: Article

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