Absorbance-modulation optical lithography

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 23, Issue 9, 2006, Pages 2290-2294

  Menon, Rajesh ^a   Smith, Henry I ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Department of Electrical Engineering and Computer Science   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LIGHT MODULATION; MATHEMATICAL MODELS; PHOTOCHROMISM; PHOTORESISTS;

ABSORBANCE-MODULATION OPTICAL LITHOGRAPHY; PHOTOCHROMIC MATERIAL; RADIATION REVERSES;

PHOTOLITHOGRAPHY;

EID: 33750581806     PISSN: 10847529     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAA.23.002290     Document Type: Article

References (17)

1. Selected Papers on Resolution Enhancement Techniques in Optical Lithography, Vol. MS 178, F. M. Schellenberg, ed. (SPIE, 2004).
2. A. P. Chu, K. K. Berggren, K. S. Johnson, and M. G. Prentiss, "A virtual slit for atom optics and nanolithography," Quantum Semiclassic. Opt. 8, 521-529 (1996).
3. L. Kastrup, H. Blom, C. Eggeling, and S. W. Hell. "Fluorescence fluctuation spectroscopy in subdiffraction focal volume," Phys. Rev. Lett. 94, 178104/1-6 (2005).
4. S. W. Hell, S. Jakobs, and L. Kastrup, "Imaging and writing at the nanoscale with focused visible light through saturable optical transitions," Appl. Phys. A 77, 859-860 (2003).
5. S. W. Hell, "Strategy for far-field optical imaging and writing without diffraction limit," Phys. Lett. A 326, 140-145 (2004).
6. B. F. Griffing and P. R. West, "Contrast enhanced photolithography," IEEE Electron Device Lett. 4, 14-16 (1983).
7. B. F. Griffing and P. R. West, "Contrast enhanced photoresists - processing and modeling," Polym. Eng. Sci. 23, 947-952 (1983).
8. J. C. Crano and R. J. Guglielmetti, Organic Photochromic and Thermochromic Compounds (Plenum, 1999).
9. K. K. Berggren, A. Bard, J. L. Wilbur, J. D. Gillaspy, A. G. Helg, J. J. McClelland, S. L. Rolston, W. D. Phillip, M. Prentiss, and G. M. Whitesides, "Microlithography by using neutral metastable atoms and self-assembled monolayers," Science 269, 1255-1257 (1995).
10. M. D. Levenson, T. Ebihara, G. Dai, Y. Morikawa, N. Hayashi, and T. S. Meng, "Optical vortex masks for via levels," J. Microlithogr. Microfabr. Microsyst. 3, 293-304 (2004).
11. D. W. Prather and S. Shi, "Formulation and application of the finite-difference time-domain method for the analysis of axially symmetric diffractive optical elements," J. Opt. Soc. Am. A 16, 1131-1142 (1999).
12. V. V. Kotlyar, A. A. Almazov, S. N. Khonina, V. A. Soifer, H. Elfstrom, and J. Turunen, "Generation of phase singularity through diffracting a plane or Gaussian beam by a spiral phase plate," J. Opt. Soc. Am. A 22, 849-861 (2005).
13. S. N. Khonina, V. V. Kotlyar, M. V. Shinkaryev, V. A. Soifer, and G. V. Uspleniev, "The phase rotor filter," J. Mod. Opt. 39, 1147-1154 (1992).
14. M. Irie, "Diarylethenes for memories and switches," Chem. Rev. (Washington, D.C.) 100, 1685-1716 (2000).
15. Y. Yokoyama, "Fulgides for memories and switches," Chem. Rev. (Washington, D.C.) 100, 1717-1739 (2000).
16. R. Menon, A. Patel, E. E. Moon, and H. I. Smith, "An alpha prototype system for zone-plate-array lithography," J. Vac. Sci. Technol. B 22, 3032-3037 (2004).
17. D. Chao, A. Patel, T. Barwicz, H. I. Smith, and R. Menon, "Immersion zone-plate-array lithography," J. Vac. Sci. Technol. B 23, 2657-2661 (2005).