Nitrogen incorporation into titanium diboride films deposited by dc magnetron sputtering: Structural modifications

Thin Solid Films

Volumn 517, Issue 19, 2009, Pages 5683-5688

  Sanchez, C M T ^a   Fonseca Filho, H D ^a   Maia da Costa, M E H ^a   Freire Jr , F L ^a  

^a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

Atomic force microscopy; Borides; Sputtering; Stress; Surface roughness; X ray diffraction; X ray photoelectron spectroscopy (XPS)

Indexed keywords

AFM; ARGON ATMOSPHERES; ATOMIC DENSITY; ATOMIC FORCE MICROSCOPES; CHEMICAL CHARACTERIZATION; CHEMICAL COMPOSITIONS; DC MAGNETRON SPUTTERING; FILM MICROSTRUCTURES; FILM SURFACES; FRICTION CHARACTERIZATION; INTERNAL STRESS; LATERAL FORCE; MECHANICAL AND TRIBOLOGICAL PROPERTIES; NANOCRYSTALLINE; NITROGEN INCORPORATION; NITROGEN PARTIAL PRESSURES; ROOM TEMPERATURE; RUTHERFORD BACK-SCATTERING SPECTROMETRY; STRUCTURAL MODIFICATIONS; TITANIUM BORON NITRIDE; TITANIUM DIBORIDE; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS); XPS; XRD;

ARGON; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; BORIDES; BORON; BORON NITRIDE; DIFFRACTION; ELECTRON SPECTROSCOPY; FRICTION; MAGNETRONS; METAL ANALYSIS; NITRIDES; NITROGEN; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPACE PROBES; SPECTRUM ANALYSIS; SURFACE ANALYSIS; SURFACE PROPERTIES; SURFACE ROUGHNESS; TITANIUM; TITANIUM NITRIDE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAYS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 66049133687     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.122     Document Type: Article

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