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Volumn 187, Issue 1, 2004, Pages 98-105

X-Ray photoelectron spectroscopy characterization of reactively sputtered Ti-B-N thin films

Author keywords

Boron; Hardness; Microstructure; Thin films; Ti B N; X Ray photoelectron spectroscopy (XPS)

Indexed keywords

MICROSTRUCTURE; SUBSTRATES; THERMODYNAMIC STABILITY; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 18244391460     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.11.024     Document Type: Article
Times cited : (63)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.