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Volumn 187, Issue 1, 2004, Pages 98-105
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X-Ray photoelectron spectroscopy characterization of reactively sputtered Ti-B-N thin films
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Author keywords
Boron; Hardness; Microstructure; Thin films; Ti B N; X Ray photoelectron spectroscopy (XPS)
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Indexed keywords
MICROSTRUCTURE;
SUBSTRATES;
THERMODYNAMIC STABILITY;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
MOLE FRACTION;
MULTIPHASE MICROSTRUCTURE;
NANOINDENTATION;
TITANIUM COMPOUNDS;
COATING;
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EID: 18244391460
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2003.11.024 Document Type: Article |
Times cited : (63)
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References (22)
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