Conventional and ionized magnetron sputter-deposition of nanocrystalline titanium diboride thin films

Tribology Letters

Volumn 5, Issue 2-3, 1998, Pages 131-134

  Wu, Mei Ling ^a   Lin, Xi Wei ^a   Dravid, Vinayak P ^a   Chung, Yip Wah ^a   Wong, Ming Show ^b   Sproul, William D ^b,c  

^a Northwestern University   (United States)

^b Materials Technology Laboratory   (United States)

^c Sputtered Films Inc   (United States)

Author keywords

Coating; Hardness; Magnetron sputtering; Nanoindentation; Titanium diboride

Indexed keywords

EID: 0009251553     PISSN: 10238883     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1019154010956     Document Type: Article

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