Effects of nitrogen content on microstructure and oxidation behaviors of Ti-B-N nanocomposite thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 2, 2006, Pages 340-349

  Lu, Y H ^a,b   Shen, Y G ^b   Zhou, Z F ^b   Li, K Y ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; NITROGEN; OXIDATION; TERNARY SYSTEMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DC-MAGNETRON SPUTTERING; NITROGEN FLOW RATE; OXIDATION RATE; TI-B-N NANOCOMPOSITE THIN FILMS;

THIN FILMS;

EID: 33644593863     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2172949     Document Type: Article

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