Theoretical analysis of development behavior of resist measured by QCM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Toriumi, Minoru ^a  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Characteristic matrix method; Dissolution; QCM; Resist; Swelling

Indexed keywords

DISSOLUTION; MATRIX ALGEBRA; NATURAL FREQUENCIES; RIGIDITY; SWELLING;

CASE-II DIFFUSION; CHARACTERISTIC MATRICES; DOUBLE PEAK; DRY LAYERS; LAYER MODEL; RESIST; RESONANCE FREQUENCIES; SINGLE PEAK;

QUARTZ CRYSTAL MICROBALANCES;

EID: 65849209119     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813939     Document Type: Conference Paper

References (14)

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