Diffusion mechanism of water for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Toriumi, Minoru ^a   Matsubara, Chie ^a   Otoguro, Akihiko ^b   Itani, Toshiro ^b  

^a OSAKA UNIVERSITY   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Diffusion; Immersion lithography; Kinetics; Leaching; Photoresist; QCM; Topcoat

Indexed keywords

DIFFUSION; LEACHING; LITHOGRAPHY; MOLECULAR WEIGHT; PHOTORESISTS; POLYNOMIALS; QUARTZ; REACTION KINETICS;

IMMERSION LITHOGRAPHY; POLYNOMIAL FUNCTION; QCM; QUARTZ CRYSTAL; RESIST FILMS; TOPCOAT;

WATER;

EID: 33745604303     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656208     Document Type: Conference Paper

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