SCOPUS 정보 검색 플랫폼

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

Highly hydrophobic materials for ArF immersion lithography

(5) Takebe, Yoko a Shirota, Naoko a Sasaki, Takashi a Murata, Koichi a Yokokoji, Osamu a

a ASAHI GLASS CO LTD (Japan)

Author keywords

Contact angle; Fluoropolymer; Hydrophobicity; Immersion lithography; Polymer blend; Topcoat

Indexed keywords

BLENDING; CARBOXYLIC ACIDS; CONTACT ANGLE; COPOLYMERIZATION; COPOLYMERS; FLUORINE CONTAINING POLYMERS; HYDROPHOBICITY; MATERIALS PROPERTIES; MONOMERS; ORGANIC ACIDS; PHOTOLITHOGRAPHY; POLYMERS; SOLUBILITY; SURFACE CHEMISTRY; SURFACE TENSION; TERNARY SYSTEMS;

ARF IMMERSION LITHOGRAPHIES; BLENDED POLYMERS; BLENDING RATIOS; CARBOXYLIC ACID GROUPS; CYCLIC STRUCTURES; FLUORINATED MONOMERS; FLUORO POLYMERS; FLUOROPOLYMER; HYDROPHOBIC MATERIALS; IMMERSION LITHOGRAPHIES; IMMERSION LITHOGRAPHY; INTERFACIAL PROPERTIES; LOW SURFACE ENERGIES; MONOCYCLIC STRUCTURES; PERFLUORINATED; RECEDING CONTACTS; RESIST DEVELOPING; RESIST MATERIALS; SCAN RATES; TOPCOAT;

PHOTORESISTS;

EID: 57349106550 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.772525 Document Type: Conference Paper

Times cited : (5)

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