Synthesis of novel α-fluoroacrylates and related polymers for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Yamashita, Tsuneo ^a   Ishikawa, Takuji ^a   Morita, Masamichi ^a   Kanemura, Takashi ^a   Aoyama, Hirokazu ^a  

^a DAIKIN INDUSTRIES LTD   (Japan)

Author keywords

Fluoroalcohol; Fluoropolymers; Immersion lithography; Quartz crystal microbalance (QCM); Resist; Top coat; Top coat less resist

Indexed keywords

CHEMICAL REACTIONS; CONTACT ANGLE; DISSOLUTION; FLUORINE CONTAINING POLYMERS; MONOMERS; OPTICAL GLASS; OXIDE MINERALS; PHOTOLITHOGRAPHY; POLYMERIZATION; POLYMERS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; RESINS; SURFACE PROPERTIES;

FLUOROALCOHOL; FLUOROPOLYMERS; IMMERSION LITHOGRAPHY; QUARTZ CRYSTAL MICROBALANCE (QCM); RESIST;

PHOTORESISTS;

EID: 57349153123     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772262     Document Type: Conference Paper

References (15)

1. T. Hagiwara, T. Furukawa, T. Itani, K. Fujii, T. Ishikawa, M. Koh, T. Kodani, T. Moriya, T. Yamashita, T. Araki, M. Toriumi, H. Aoyama, "Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography," Proc. SPIE 5376, 159(2004)
2. M. Koh, T. Ishikawa, T. Araki, H. Aoyama, T. Yamashita, T. Yamazaki, H. Watanabe, M. Toriumi, and T. Itani, "The study on dry etch resistance of Fluorine functionalized polymers," Proc. SPIE 4690, 486 (2002).
3. M. Koh, T. Ishikawa, T. Araki, H. Aoyama, T. Yamashita, T. Yamazaki, H. Watanabe, M. Toriumi, and T. Itani, "Synthesis of novel fluorinated norbornene derivatives for 157 nm application," Proc. SPIE 5039, 589 (2003).
4. M. Toriumi, M. Koh, T. Ishikawa, T. Araki, H. Aoyama, T. Yamashita, T. Yamazaki, H. Watanabe, and T. Itani, "Novel Main-chain-Fluorinated Polymers for 157-nm Photoresists," Proc. SPIE 5039, 53 (2003).
5. T. Ishikawa, T. Kodani, M. Koh, T. Moriya, T. Araki, H. Aoyama, T. Yamashita, M. Toriumi, T. Hagiwara, T. Furukawa, T. Itani, K. Fujii, " The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials," Proc. SPIE 5376, 169 (2004).
6. M. Toriumi, T. Ohfuji, M. Endo, and H. Morimoto, "Swelling Analysis of Methacrylate Polymers in Aqueous Alkaline Developer," J. Photopolymer Sci. Technol. 12, 545 (1999);
7. Toriumi, S. Ishikawa, and T. Itani, "Resist polymer dissolution study using Quartz Crystal Microbalance method," in Forefront of Lithographic Materials Research, Society of Plastic Engineers, Mid Hudson Section, pp. 271-281 (2001);
8. Toriumi, T. Itani, J. Yamashita, T. Sekine, and K. Nakatani, "Dissolution characteristics of resist polymers studied by the Quartz Crystal Microbalance transmission-line analysis and the pKa acidity analysis", Proc. SPIE 4690 904 (2002) and references therein.
9. T. Yamashita, T. Ishikawa, T. Yoshida, T. Hayami, T. Araki, H. Aoyama, T. Hagiwara, T. Itani, K. Fujii, " Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography," Proc. SPIE 5753, 564 (2005).
10. T. Yamashita, T. Ishikawa, T. Yoshida, T. Hayami, T. Araki, H. Aoyama, T. Hagiwara, T. Itani, K. Fujii, " Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography," J. Photopolymer Sci. Technol. 18, 631 (2005).
11. T. Yamashita, T. Ishikawa, T. Yoshida, T. Hayami, H. Aoyama, " Novel fluorinated polymers for application in 193-nm lithography and 193-nm immersion lithography " Proc. SPIE 6153-81 (2006).
12. K. Ishiwari, A. Ohmori, S. Koizumi, Nippon Kagaku Kaishi, 10, 1942 (1985).
13. Nippon Koukai Tokkyo Kouhou, JP2003-40840, JP2005-206587, JP2005-239710, JP2007-204385
14. D. Sanders, L. Sundberg, R. Sooriyakumaran, P. Brock, R. DiPietro, H. Truong, D. Miller, M. Lawson, R. Allen, "Fluoroalchohol Materials with Tailored Interfacial Propaties for Immersion Lithography," Proc. SPIE 6519, 651904-1 (2007).
15. M. Morita, H. Ogisu, M. Kubo, "Surface properties of perfluoroalkylethyl acrylate/n-alkyl acrylate copolymers", J. Applied Polymer Science, 73 (19),1741 (1999).