Low out-gassing organic spin-on hardmask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Minegishi, Shinya ^a   Yoshimura, Nakaatsu ^a   Sato, Mitsuo ^a   Konno, Yousuke ^a   Konno, Keiji ^a   Slezak, Mark ^b   Takahashi, Junichi ^a   Abe, Shigeru ^a   Yamaguchi, Yoshikazu ^a   Shimokawa, Tsutomu ^a  

^a JSR CORPORATION   (Japan)

^b JSR Micro   (United States)

Author keywords

Etch resistance; Gap filling; Low out gassing; Multi layer resist process; Spin on organic hardmask

Indexed keywords

ETCH RESISTANCE; GAP-FILLING; LOW OUT-GASSING; MULTI-LAYER RESIST PROCESS; SPIN-ON ORGANIC HARDMASK;

ELECTRON BEAM LITHOGRAPHY; OPTICAL CABLES; ORGANIC CARBON; REFLECTION; SILICON; SILICON ON INSULATOR TECHNOLOGY; SPIN DYNAMICS;

GALLIUM ALLOYS;

EID: 57349185996     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771621     Document Type: Conference Paper

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