Variable-energy positron annihilation study of subnanopores in SiOCH-based PECVD films

Radiation Physics and Chemistry

Volumn 76, Issue 2, 2007, Pages 213-216

  Ito, Kenji ^a   Oka, Toshitaka ^a   Kobayashi, Yoshinori ^a   Suzuki, Ryoichi ^a   Ohdaira, Toshiyuki ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Hexamethyldisiloxane; PECVD; Positron annihilation; Subnanopore; Tetraethyl orthosilicate; Thin film

Indexed keywords

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROSITY; POSITRON ANNIHILATION SPECTROSCOPY; THIN FILMS;

HEXAMETHYLDISILOXANE; POSITRON ANNIHILATION; SUBNANOPORES; TETRAETHYL ORTHOSILICATE;

NANOSTRUCTURED MATERIALS;

SILICATE; SILOXANE;

ARTICLE; FILM; MEASUREMENT; NANOPARTICLE; PARTICLE SIZE; POROSITY; POSITRON; POSITRON EMISSION TOMOGRAPHY; REFRACTION INDEX; VAPORIZATION;

EID: 33751167024     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radphyschem.2006.03.038     Document Type: Article

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