Study of the inductively coupled plasma assisted DC magnetron sputtering (ICPDMS) during ITO deposition

Thin Solid Films

Volumn 517, Issue 14, 2009, Pages 4165-4169

  Yang, Ie Hong ^a   Lee, Youjong ^a   Jang, Jin Nyeung ^a   Hong, MunPyo ^a  

^a Korea University   (South Korea)

Author keywords

DC magnetron sputtering; Indium tin oxide; Inductively coupled plasma (ICP)

Indexed keywords

AFTER HIGH TEMPERATURES; DC MAGNETRON SPUTTERING; ELECTRICAL PROPERTIES; HEAT CYCLES; HIGH DENSITY PLASMAS; HIGH-TEMPERATURE DURABILITIES; HIGH-VACUUM CONDITIONS; ICP SOURCES; INDIUM TIN OXIDE; INDIUM TIN OXIDE THIN FILMS; ITO THIN FILMS; OXYGEN ATOMS; PHOTOVOLTAIC SOLAR CELLS; POST-ANNEALING; RF-POWER; ROOM TEMPERATURES; ROOM-TEMPERATURE PROCESS;

BIOACTIVITY; CARRIER CONCENTRATION; ELECTRIC PROPERTIES; HIGH TEMPERATURE APPLICATIONS; INDIUM; MAGNETRON SPUTTERING; MAGNETRONS; OXIDE FILMS; OXYGEN; PHOTORESISTS; PLASMA DEPOSITION; SOLAR ENERGY; SOLAR POWER GENERATION; THIN FILMS; TIN; TITANIUM COMPOUNDS;

INDUCTIVELY COUPLED PLASMA;

EID: 65449179265     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.032     Document Type: Article

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