메뉴 건너뛰기




Volumn 94, Issue 16, 2009, Pages

Gate-controlled nonvolatile graphene-ferroelectric memory

Author keywords

[No Author keywords available]

Indexed keywords

BINARY INFORMATIONS; ELECTRIC DIPOLES; EXPERIMENTAL OBSERVATIONS; FERROELECTRIC MEMORIES; FIELD EFFECTS; GATE VOLTAGES; GRAPHENE; HYBRID DEVICES; LOW-RESISTANCE STATE; NON VOLATILE MEMORY DEVICES; NONVOLATILE; RESISTANCE CHANGES; TRANSISTOR STRUCTURES;

EID: 65449143255     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3119215     Document Type: Article
Times cited : (248)

References (25)
  • 4
  • 9
    • 34547820166 scopus 로고    scopus 로고
    • 0036-8075,. 10.1126/science.1144657
    • J. R. Williams, L. DiCarlo, and C. M. Marcus, Science 0036-8075 317, 638 (2007). 10.1126/science.1144657
    • (2007) Science , vol.317 , pp. 638
    • Williams, J.R.1    Dicarlo, L.2    Marcus, C.M.3
  • 22
    • 56349096394 scopus 로고    scopus 로고
    • 1530-6984,. 10.1021/nl080241l
    • Y. M. Lin and P. Avouris, Nano Lett. 1530-6984 8, 2119 (2008). 10.1021/nl080241l
    • (2008) Nano Lett. , vol.8 , pp. 2119
    • Lin, Y.M.1    Avouris, P.2
  • 24
    • 34347363039 scopus 로고    scopus 로고
    • Here graphene is treated as a perfect metal and Guass's law has been used to obtain Egraphene. Graphene could have a dielectric constant of around 4, induced by the SiO2 substrate. See, 0163-1829,. 10.1103/PhysRevB.75.205418
    • Here graphene is treated as a perfect metal and Guass's law has been used to obtain Egraphene. Graphene could have a dielectric constant of around 4, induced by the SiO2 substrate. See E. H. Hwang and S. D. Sarma, Phys. Rev. B 0163-1829 75, 205418 (2007). 10.1103/PhysRevB.75.205418
    • (2007) Phys. Rev. B , vol.75 , pp. 205418
    • Hwang, E.H.1    Sarma, S.D.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.