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Volumn 41, Issue 24, 2008, Pages

Ablation dynamics of tin micro-droplet irradiated by double pulse laser used for extreme ultraviolet lithography source

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION DYNAMICS; DENSE PARTICLES; DOUBLE PULSE LASERS; FARADAY CUPS; HIGH-SPEED IMAGING; KINETIC BEHAVIOURS; LASER-INDUCED FLUORESCENCE IMAGING; MAIN PULSE; ND : YAG LASERS; PLASMA EXPANSIONS; PRE PULSE; PULSE IRRADIATIONS; Q-SWITCHED ND:YAG LASERS; REACTION FORCES;

EID: 65449126738     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/24/245210     Document Type: Article
Times cited : (11)

References (16)
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    • High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography
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  • 10
    • 57049097086 scopus 로고    scopus 로고
    • Neutral debris mitigation in laser produced extreme ultraviolet light source by the use of minimum-mass tin target
    • Shimomura M et al 2008 Neutral debris mitigation in laser produced extreme ultraviolet light source by the use of minimum-mass tin target Appl. Phys. Express 1 056001
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    • Shimomura, M.1    Al, E.2
  • 11
    • 33750735066 scopus 로고    scopus 로고
    • Behavior of debris from laser-produced plasma for extreme ultraviolet light source measured by laser imaging technique
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  • 15
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    • Propagation velocity of laser-induced plasma inside and outside a transparent droplet
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.