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Surface Review and Letters

Volumn 16, Issue 2, 2009, Pages 265-270

Surface metalization on the photo-emission, photo-absorption and core-level shift of nanosolid silicon

(4) Pan, Likun a Li, Haibo a Sun, Zhuo a Sun, Changqing b

a East China Normal University (China)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

Crystal field; Metalization; Porous silicon

Indexed keywords

ANODIZATION; BLUE SHIFTS; CORE-LEVEL SHIFTS; CRYSTAL FIELD; CU DIFFUSIONS; FILTERED CATHODIC VACUUM ARCS; IN VACUUMS; LEVEL SHIFTS; METALIZATION; NANOSOLID SILICONS; PHOTO ABSORPTIONS; RED SHIFTS; ROOM TEMPERATURES; SI WAFERS; TI FILMS; X-RAY DIFFRACTION STUDIES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ABSORPTION; ABSORPTION SPECTROSCOPY; AMORPHOUS FILMS; ANNEALING; COPPER; EMISSION SPECTROSCOPY; POROUS SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICIDES; SILICON WAFERS; SURFACE DIFFUSION; TITANIUM; VACUUM; VACUUM APPLICATIONS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 65349133539 PISSN: 0218625X EISSN: None Source Type: Journal
DOI: 10.1142/S0218625X09012573 Document Type: Article

Times cited : (2)

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