Structural and electrical properties of porous silicon with rf-sputtered Cu films

Materials Science and Engineering: B

Volumn 90, Issue 1-2, 2002, Pages 103-109

  Ansari, Z A ^a   Hong, Kwangpyo ^a   Lee, Chongmu ^a  

^a Inha University   (South Korea)

Author keywords

AFM; Copper; I V characteristics; Porous silicon; SEM; Sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELLIPSOMETRY; ETCHING; METALLIC FILMS; PHOTOLUMINESCENCE; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SPUTTER DEPOSITION;

SEMI-TRANSPARENT FILMS;

POROUS SILICON;

EID: 0037034718     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00917-5     Document Type: Article

References (17)