Structural evolution of TiO2 nanocrystalline thin films by thermal annealing and swift heavy ion irradiation

Journal of Applied Physics

Volumn 105, Issue 7, 2009, Pages

  Rath, H ^a   Dash, P ^a   Som, T ^b   Satyam, P V ^b   Singh, U P ^c   Kulriya, P K ^d   Kanjilal, D ^d   Avasthi, D K ^d   Mishra, N C ^a  

^a UTKAL UNIVERSITY   (India)

^b INSTITUTE OF PHYSICS   (India)

^c KIIT UNIVERSITY   (India)

^d INTER UNIVERSITY ACCELERATOR CENTRE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE PHASE; AS-DEPOSITED FILMS; COMPETING EFFECTS; FLUENCE; GLANCING ANGLE X-RAY DIFFRACTIONS; NANO PARTICLES; NANO-CRYSTALLINE THIN FILMS; RUTILE PHASE; RUTILE TIO2; SILICONS (100); SOL - GELS; SPIN COATING TECHNIQUES; STRUCTURAL EVOLUTIONS; SWIFT HEAVY ION IRRADIATIONS; SWIFT HEAVY IONS; TEMPERATURE INTERVALS; THERMAL SPIKES; THERMAL-ANNEALING; TIO2 NANOCRYSTALLINE THIN FILMS;

AMORPHOUS FILMS; ANNEALING; GELATION; GRAIN BOUNDARIES; GRAIN GROWTH; GRAIN SIZE AND SHAPE; HEAVY IONS; IRRADIATION; NANOCRYSTALLINE MATERIALS; OXIDE MINERALS; SEMICONDUCTING SILICON COMPOUNDS; SILVER; THIN FILMS; TITANIUM DIOXIDE;

TITANIUM OXIDES;

EID: 65249138698     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3103333     Document Type: Article

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