Characterization of metal-doped TiO2 films by RBS/channeling

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 268-271

  Yamamoto, S ^a   Yamaki, T ^a   Naramoto, H ^b   Tanaka, S ^a  

^a JAERI Takasaki ^*  (Japan)

^b Japan Atomic Energy Research Institute   (Japan)

Author keywords

Laser epitaxy; Titanium compounds; X ray diffraction

Indexed keywords

ANNEALING; DOPING (ADDITIVES); PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

METAL-DOPED FILMS;

THIN FILMS;

EID: 0037568019     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00742-0     Document Type: Conference Paper

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