Soft processing for formation of self-assembled monolayer on hydrogen-terminated silicon surface based on visible-light excitation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 2, 2009, Pages 858-862

  Sano, Hikaru ^a   Yaku, Tomohiro ^a   Ichii, Takashi ^a   Murase, Kuniaki ^a   Sugimura, Hiroyuki ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYL CHAINS; ATOMIC FORCES; BULK SILICONS; COMPACT MONOLAYERS; DOPING DENSITIES; HYDROGEN-TERMINATED SILICON SURFACES; HYDROGEN-TERMINATED SILICONS; SILICON SUBSTRATES; SILICON SURFACES; VISIBLE-LIGHT EXCITATIONS; VISIBLE-LIGHT IRRADIATIONS; WATER CONTACT ANGLE MEASUREMENTS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ANGLE MEASUREMENT; ATOMIC SPECTROSCOPY; CHEMICAL REACTIONS; CONTACT ANGLE; HYDROGEN; SELF ASSEMBLED MONOLAYERS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 64549147169     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3065485     Document Type: Article

References (31)

1. A. Ulman, Chem. Rev. (Washington, D.C.) 96, 1533 (1996).
2. H. Sugimura, in Nanoclistalline Materials Their Synthesis-Structure- Property Relationships and Applications, edited by, S. C. Tjong, (Elsevier, Oxford, 2006), Chap.
3. P. R. Moses and R. W. Murray, J. Am. Chem. Soc. 98, 7435 (1976).
4. T. Osa and M. Fujihira, Nature (London) 264, 349 (1976).
5. J. Sagiv, J. Am. Chem. Soc. 102, 92 (1980).
6. S. R. Wasserman, Y.-T. Tao, and G. M. Whitesides, Langmuir 5, 1074 (1989).
7. M. R. Linford and C. E. D. Chidsey, J. Am. Chem. Soc. 115, 12631 (1993).
8. M. R. Linford, P. Fenter, P. M. Eisenberger, and C. E. D. Chidsey, J. Am. Chem. Soc. 117, 3145 (1995).
9. R. Boukherroub, S. Morin, P. Sharpe, and D. D. M. Wayner, Langmuir 16, 7429 (2000).
10. F. Effenberger, G. Götz, B. Bidlingmaier, and M. Wezstein, Angew. Chem., Int. Ed. 37, 2462 (1998).
11. J. M. Buriak, Chem. Rev. (Washington, D.C.) 102, 1271 (2002).
12. W. Cai, Z. Lin, T. Strother, L. M. Smith, and R. J. Hamers, J. Phys. Chem. B 106, 2656 (2002).
13. M. R. Kosuri, H. Gerung, Q. Li, S. M. Han, B. C. Bunker, and T. M. Mayer, Langmuir 19, 9315 (2003).
14. C. Coletti, A. Marrone, G. Giorgi, A. Sgamellotti, G. Cerofolini, and N. Re, Langmuir 22, 9949 (2006).
15. G. P. Lopinski, D. D. M. Wayner, and R. A. Wolkow, Nature (London) 406, 48 (2000).
16. S. Pai and D. Doren, J. Phys. Chem. 98, 4422 (1994).
17. M. P. Stewart and J. M. Buriak, J. Am. Chem. Soc. 123, 7821 (2001).
18. Q.-Y. Sun, L. C. P. M. de Smet, B. van Lagen, A. Wright, H. Zuilhof, and E. J. A. R. Sudhölter, Angew. Chem., Int. Ed. 43, 1352 (2004).
19. B. J. Eves, Q.-Y. Sun, G. P. Lopinski, and H. Zuilhof, J. Am. Chem. Soc. 126, 14318 (2004).
20. L. C. P. M. de Smet, G. A. Stork, G. H. F. Hurenkamp, Q.-Y. Sun, H. Topal, J. E. Vronen, A. B. Sieval, A. Wright, G. M. Visser, H. Zuilhof, and E. J. R. Sudhölter, J. Am. Chem. Soc. 125, 13916 (2003).
21. Q.-Y. Sun, L. C. P. M. de Smet, B. van Lagen, M. Giesbers, P. C. Thüne, J. van Engelenburg, F. A. de Wolf, H. Zuilhof, and E. J. R. Sudhölter, J. Am. Chem. Soc. 127, 2514 (2005).
22. H. Sano, H. Maeda, S. Matsuoka, K.-H. Lee, K. Murase, and H. Sugimura, Jpn. J. Appl. Phys. 47, 5659 (2008).
23. C. Miramond and D. Vuillaume, J. Appl. Phys. 96, 1529 (2004).
24. S. M. Sze, Semiconductor Devices: Physics and Technology, 2nd ed. (Wiley, New York, 1981), p. 49 [in Japanese].
25. H. Sugimura, A. Hozumi, T. Kameyama, and O. Takai, Surf. Interface Anal. 34, 550 (2002).
26. S. Kurokawa, T. Takei, and A. Sakai, Jpn. J. Appl. Phys., Part 1 42, 4655 (2003).
27. H. Fukidome and M. Matsumura, Appl. Surf. Sci. 130-132, 146 (1998).
28. A. Lehner, G. Steinhoff, M. S. Brandt, M. Eickhoff, and M. Stutzmann, J. Appl. Phys. 94, 2289 (2003).
29. E. D. Palik, Handbook of Optical Constants of Solids (Academic, San Diego, 1998).
30. Y. Sato and M. Maeda, Jpn. J. Appl. Phys., Part 1 33, 6508 (1994).
31. A. Ulman, An Introduction to Ultrathin Organic Films from Langmuir-Blogett to Self-Assembly (Academic, San Diego, 1991), p. 281.