Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films

Transactions of Nonferrous Metals Society of China (English Edition)

Volumn 19, Issue 2, 2009, Pages 359-363

  ZHOU, Ji cheng ^a   LUO, Di tian ^a   LI, You zhen ^a   LIU, Zheng ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

DC reactive magnetron sputtering; rapid thermal annealing(RTA); sputtering pressure; Ta2O5 thin films

Indexed keywords

ANNEALING TEMPERATURES; DC REACTIVE MAGNETRON SPUTTERING; EXTINCTION CO-EFFICIENT; HEXAGONAL STRUCTURES; LOW TEMPERATURES; ORTHORHOMBIC STRUCTURES; SPUTTERING PRESSURE; SURFACE CHARACTERISTICS; TA2O5 THIN FILMS;

ELECTRODEPOSITION; MAGNETRONS; ORGANIC POLYMERS; PRESSURE EFFECTS; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; REFRACTIVE INDEX; SURFACE ROUGHNESS; TANTALUM; THIN FILMS;

AMORPHOUS FILMS;

EID: 64149126552     PISSN: 10036326     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1003-6326(08)60278-2     Document Type: Article

References (19)

1. 5 thin films deposited using the spin coating process [J]. Thin Solid Films 295 (1997) 11-15
2. 2 thin films by plasma ion assisted deposition method [J]. Surface & Coatings Technology 196 (2005) 69-75
3. 5 as high-k dielectric for nanoscale DRAMs [J]. Microelectronics Reliability 47 6 (2007) 913-923
4. 5) thin solid films for advanced dielectric applications [J]. Materials Science and Engineering R R22 (1998) 269-322
5. 5 films [J]. Journal of the European Ceramic Society 23 2 (2003) 247-251
6. 5 film growth with chemical vapor deposition [J]. Journal of Functional Material 36 4 (2006) 511-514 (in Chinese).
7. 5 thin films [J]. Vacuum 77 3 (2005) 329-335
8. 5 thin film [J]. Vacuum 44 5 (2007) 32-35 (in Chinese).
9. 2 for storage capacitor application [J]. Microelectronics Reliability 42 8 (2002) 1171-1177
10. 2 multi-layer stacks [J]. Thin Solid Films 516 2/4 (2007) 136-140
11. 2) and their properties after annealing [J]. Thin Solid Films 447/448 (2004) 509-515
12. 5 thin films [J]. Solar Energy Materials & Solar Cell 59 (1999) 367-375
13. 5-Si structures [J]. Microelectronics Journal 31 8 (2000) 653-661
14. x [J]. Trans Nonferrous Me Soc China 17 4 (2007) 733-738
15. MANIFACIER J.C., GASIOT J., and FILLARD J.P. A simple method for the determination of the optical constants n, k and the thickness of a weekly absorbing thin-film [J]. Journal of Physics E: Scientific Instruments 9 (1976) 1002-1004
16. SWANEPOEL R. Determination of the thickness and optical constants of amorphous silicon [J]. Journal of Physics E: Scientific Instruments 16 (1983) 1214-1222
17. MARQUEZ E., RAMIREZ M.J., and VILLARES P. Calculation of the thickness and optical constants of amorphous arsenic sulphide films from their transmission spectra [J]. Journal of Physics D: Applied Physics 25 (1992) 535-541
18. Joint Committee on Powder Diffraction Standards. Powder Diffraction File [S] (1967), ASTM, Philadelphia, PA
19. 5 films [J]. Thin Solid Films 515 4/5 (2006) 1674-1682