The study of optical and microstructural evolution of Ta2 O5 and SiO2 thin films by plasma ion assisted deposition method

Surface and Coatings Technology

Volumn 196, Issue 1-3 SPEC. ISS., 2005, Pages 69-75

  Liu, Wen Jen ^a   Guo, Xing Jian ^b   Chien, Chia Hung ^a  

^a I SHOU UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Atomic force microscopy; Dense wavelength division multiplexing; Electron beam evaporation; Ion bombardment; Silicon oxide; Transmission electron microscopy

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; GLASS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; QUARTZ; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SPECTROPHOTOMETERS; SURFACE ROUGHNESS; THIN FILMS;

ANNEALING TEMPERATURE; MICROSTRUCTURAL EVOLUTION; PLASMA ION ASSISTED DEPOSITION (PIAD); THERMAL ANNEALING;

TANTALUM COMPOUNDS;

MICROSTRUCTURE;

EID: 18144365424     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.098     Document Type: Article

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