Near-interfacial delamination failures observed in ion-beam-sputtered Ta2O5/SiO2 multi-layer stacks

Thin Solid Films

Volumn 516, Issue 2-4, 2007, Pages 136-140

  Grigonis, Marius ^a   Hebenstreit, Wilhelm ^a   Tilsch, Markus K ^a  

^a JDS UNIPHASE   (United States)

Author keywords

Delamination; Ion beam sputtering; Multi layers; Ta2O5 SiO2

Indexed keywords

ATOMIC FORCE MICROSCOPY; DELAMINATION; ION BEAMS; MULTILAYERS; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

ION-BEAM SPUTTERING; MULTI-LAYER COATINGS; MULTI-LAYER STACKS;

TANTALUM COMPOUNDS;

EID: 36048939680     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.133     Document Type: Article

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