Structural and electrical characteristics of nitrogen-doped nanocrystalline diamond films prepared by CVD

Journal of Physics D: Applied Physics

Volumn 42, Issue 2, 2009, Pages

  Hu, Qiang ^a   Hirai, Makoto ^b   Joshi, Rakesh K ^a   Kumar, Ashok ^a,b  

^a University of South Florida   (United States)

^b UNIVERSITY OF SOUTH FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DIAMOND FILMS; DIAMONDS; DISTILLATION; MICROWAVES; NANOCRYSTALLINE MATERIALS; OHMIC CONTACTS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON;

ELECTRICAL CHARACTERISTICS; MAJORITY CARRIERS; MICROWAVE PLASMAS; N-DOPED; NCD FILMS; NITROGEN-DOPED; OHMIC BEHAVIOURS; P-TYPE SI; PULSED LASERS; REPRODUCIBILITY; X- RAY DIFFRACTIONS;

SILVER;

EID: 63649129400     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/2/025301     Document Type: Article

References (27)

1. Mitra P, Chattopadhyay K K, Chaudhuri S and Pal A K 1994 Mater. Lett. 21 95-9
2. Locher R, Wagner J, Fuchs F, Wild C, Hiesinger P, Gonon P and Koidl P 1995 Mater. Sci. Eng. B 29 211-5
3. Collins Alan T 1996 Ceram. Int. 22 321-7
4. Tsubota T, Fukui T, Saito T, Kusakabe K, Morooka S and Maeda H 2000 Diamond Relat. Mater. 9 1362-8
5. Manivannan A, Underwood S, Morales Erie H and Seehra M S 2003 Mater. Charact. 51 329-33
6. Bhattacharyya S et al 2001 Appl. Phys. Lett. 79 1441
7. Young T F, Liu T S, Jung D J and Hsi T S 2006 Surf. Coat. Technol. 200 3145-50
8. Ma K L, Zhang W J, Zou Y S, Chong Y M, Leung K M, Bello I and Lee S T 2006 Diamond Relat. Mater. 15 626-30
9. Wang Z G, Zhao Z M, Song Y, Liu J, Sun Y M, Zhang C H, Duan J L and Jin Y F 2004 Nucl. Instrum. Methods Phys. Res. B 218 472-8
10. Kulisch W, Popov C, Boycheva S, Beshkov G, Vorlicek V, Gibson P N and Georgiev G 2004 Thin Solid Films 469-470 99-104
11. Gerbi J E, Auciello O, Birrell J and Gruen D M 2003 Appl. Phys. Lett. 83 2001-3
12. Jeedigunta S, Spagnol P, Bumgarner J and Kumar A 2008 Diamond Relat. Mater. 17 2037-40
13. Jeedigunta S, Xu Z, Hirai M, Spagnol P and Kumar A 2008 Diamond Relat. Mater. 17 1994-7
14. Das K, Venkatesan V, Miyata K, Dreifus D L and Glass J T 1992 Thin Solid Films 212 19-24
15. Harper R E, Johnston C, Chalker P R, Totterdell D, Buckley-Golder I M, Werner M, Obermeier E and Van Rossum M 1992 Diamond Relat. Mater. 1 692-6
16. Ferrari A C and Robertson J 2001 Phys. Rev. B 63 121405
17. Birrell J, Gerbi J E, Auciello O, Gibson J M, Gruen D M and Carlisle J A 2003 J. Appl. Phys. 93 5606-12
18. Nemanich R J, Glass J T, Lucovsky G and Shroder R E 1988 J. Vac. Sci. Technol. A 6 1783-7
19. Shroder R E, Nemanich R J and Glass J T 1990 Phys. Rev. B 41 3738-45
20. Pfeiffer R, Kuzmany H, Knoll P, Bokova S, Salk N and Gunther B 2003 Diamond Relat. Mater. 12 268-71
21. Kuzmany H, Pfeiffer R, Salk N and Gunther B 2004 Carbon 42 911-7
22. Manca J V, Nesladek M, Neelen M, Quaeyhaegens C, De Schepper L and De Ceuninck W 1999 Microelectron. Reliab. 39 269-73
23. Prins J F 1982 Appl. Phys. Lett. 41 950-2
24. Kalish R 1999 Carbon 37 781-5
25. May P W, Ludlow W J, Hannaway M, Heard P J, Smith J A and Rosser K N 2007 Chem. Phys. Lett. 446 103-8
26. Peguchi M, Kitabatake M and Hirao T 1996 Thin Solid Films 281-282 267-70
27. Gammon P M, Perez-Tomas A, Jennings M R, Roberts G J, Davis M C, Shah V A, Burrows E, Wilson N R, Covington J A and Mawby P A 2008 Appl. Phys. Lett. 93 1121041