Effects of plasma treatments on the nitrogen incorporated nanocrystalline diamond films

Diamond and Related Materials

Volumn 17, Issue 12, 2008, Pages 1994-1997

  Jeedigunta, Sathyaharish ^a,b   Xu, Zhenqing ^a,b   Hirai, Makoto ^a,b   Spagnol, Priscila ^c   Kumar, Ashok ^a,b  

^a University of South Florida   (United States)

^b UNIVERSITY OF SOUTH FLORIDA   (United States)

^c SRI INTERNATIONAL   (United States)

Author keywords

MPECVD; Nanocrystalline diamond films; Nitrogen plasma treatment

Indexed keywords

CARBON FILMS; CARBON NANOTUBES; DIAMOND CUTTING TOOLS; DIAMONDS; ELECTRIC CONDUCTIVITY; GRAPHITE; HYDROGEN; MICROWAVES; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOCRYSTALLINE SILICON; NANOSTRUCTURED MATERIALS; NITROGEN; NONMETALS; PASSIVATION; PLASMA APPLICATIONS; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILICON;

CRYSTALLINITY; CRYSTALLOGRAPHIC DATUM; DIAMOND LATTICES; ELECTRICAL CONDUCTIVITIES; ELECTRICAL CONTACTS; GAS CHEMISTRIES; GRAPHITIC CARBONS; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; MPECVD; NANOCRYSTALLINE DIAMOND FILMS; NCD FILMS; NITROGEN PLASMAS; PLASMA TREATMENTS; PREFERENTIAL ETCHINGS; RAMAN SPECTRUM; RELATIVE INTENSITIES; SCHOTTKY; SURFACE PASSIVATIONS; TRANSPOLYACETYLENE;

DIAMOND FILMS;

EID: 54049105237     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.06.001     Document Type: Article

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