Investigation of the growth mechanism and structure of nanocrystalline diamond films by rapid thermal annealing

Thin Solid Films

Volumn 469-470, Issue SPEC. ISS., 2004, Pages 99-104

  Kulisch, W ^a,b   Popov, C ^a   Boycheva, S ^a   Beshkov, G ^c   Vorlicek, V ^d   Gibson, P N ^b   Georgiev, G ^a  

^a UNIVERSITY OF KASSEL   (Germany)

^b JOINT RESEARCH CENTRE   (Italy)

^c INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^d INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Annealing; Growth mechanism; Nanocrystalline diamond; Structural properties

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; NUCLEATION; POLYCRYSTALS; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

GROWTH MECHANISMS; NANOCRYSTALLINE DIAMOND (NCD); NUCLEATION DENSITY; STRUCTURAL PROPERTIES;

DIAMOND FILMS;

EID: 10044268517     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.060     Document Type: Article

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