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Surface and Coatings Technology

Volumn 200, Issue 10 SPEC. ISS., 2006, Pages 3145-3150

Microstructural and electrical studies of nitrogen doped diamond thin films grown by microwave plasma CVD

(4) Young, Tai Fa a,b Liu, Tsung Shian a Jung, Der Jun a,b Hsi, Tai Sung a,b

a NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

b NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

Author keywords

Conductivity; Microstructure; Microwave CVD; Nitrogen doped diamond

Indexed keywords

CRYSTAL MICROSTRUCTURE; ELECTRIC PROPERTIES; FILM GROWTH; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; NANOSTRUCTURED MATERIALS; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON; THIN FILMS;

MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; NITROGEN DOPED DIAMOND THIN FILMS;

DIAMOND FILMS;

CRYSTAL MICROSTRUCTURE; DIAMOND FILMS; ELECTRIC PROPERTIES; FILM GROWTH; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; NANOSTRUCTURED MATERIALS; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON; THIN FILMS;

EID: 31644448413 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.07.019 Document Type: Article

Times cited : (5)

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