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Volumn 42, Issue 2, 2009, Pages
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Structure-properties relationship in reactively sputtered Ag-Cu-O films
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
ATOMS;
COPPER;
COPPER OXIDES;
CRYSTALLINE MATERIALS;
ELECTRIC RESISTANCE;
ELECTRODEPOSITION;
FLOW RATE;
METALLIC COMPOUNDS;
OPTICAL PROPERTIES;
OXIDE FILMS;
OXYGEN;
REFLECTION;
SILVER ALLOYS;
SOLID SOLUTIONS;
X RAY DIFFRACTION ANALYSIS;
ABSORPTION BANDS;
CHEMICAL COMPOSITIONS;
CHEMICAL ENVIRONMENTS;
COPPER ATOMS;
COPPER TARGETS;
COPPER-BASED;
DEPOSITED FILMS;
DEPOSITION CHAMBERS;
ELECTRICAL RESISTIVITIES;
FILM PROPERTIES;
FOUR-POINT PROBE METHODS;
GLASS SUBSTRATES;
GRAIN SIZES;
LOW OXYGENS;
METALLIC SILVERS;
OXYGEN FLOW RATES;
PREFERENTIAL OXIDATIONS;
PULSED DC SPUTTERING;
REFLECTANCE MEASUREMENTS;
ROOM TEMPERATURES;
SILVER-COPPER OXIDES;
STRUCTURE-PROPERTIES RELATIONSHIPS;
X-RAY AMORPHOUS;
X-RAY DIFFRACTIONS;
X-RAY ENERGY DISPERSIVE SPECTROMETRIES;
XRD ANALYSIS;
SILVER;
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EID: 63649086144
PISSN: 00223727
EISSN: 13616463
Source Type: Journal
DOI: 10.1088/0022-3727/42/2/025304 Document Type: Article |
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Times cited : (13)
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References (39)
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