Properties and air annealing of paramelaconite thin films

Materials Letters

Volumn 57, Issue 22-23, 2003, Pages 3676-3680

  Thobor, A ^a   Pierson, J F ^a  

^a UNIVERSITÉ DE FRANCHE COMTÉ   (France)

Author keywords

Electrical properties; Optical band gap; Oxidation; Paramelaconite; Reactive sputtering; Thin films

Indexed keywords

ANNEALING; COPPER OXIDES; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; FILM GROWTH; GLASS; MAGNETRON SPUTTERING; OXIDATION; SUBSTRATES;

RADIOFREQUENCY (RF);

THIN FILMS;

EID: 0037804131     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(03)00148-4     Document Type: Article

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