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Volumn 253, Issue 18, 2007, Pages 7522-7526
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Influence of the current applied to the silver target on the structure and the properties of Ag-Cu-O films deposited by reactive cosputtering
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Author keywords
Electrical and optical properties; Nanocrystallised silver; Reactive sputtering; Silver copper oxides; Structure
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Indexed keywords
ELECTRIC CURRENTS;
GLASS;
MAGNETRON SPUTTERING;
NANOCRYSTALLITES;
SUBSTRATES;
THIN FILMS;
DEPOSITION CHAMBER;
OXYGEN FLOW RATE;
REACTIVE COSPUTTERING;
SILVER TARGET;
SILVER COMPOUNDS;
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EID: 34249877697
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2007.03.054 Document Type: Article |
Times cited : (33)
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References (21)
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