Ordering in thermally oxidized silicon

Physical Review Letters

Volumn 93, Issue 3, 2004, Pages

  Munkholm, A ^a,b   Brennan, S ^a  

^a SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^b Philips Lumileds Lighting Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; DATA REDUCTION; DIFFRACTION; DIFFUSION; HEAT TREATMENT; INTERFACES (MATERIALS); LATTICE CONSTANTS; MATHEMATICAL MODELS; OXIDATION; REFLECTION; SILICA; THICKNESS MEASUREMENT; THIN FILMS; X RAY SCATTERING;

CRYSTAL TRUNCATION RODS (CTR); GAS PHASE PRECURSORS; MISCUT SURFACES; THERMAL OXIDATION;

SILICON WAFERS;

EID: 4344583110     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.93.036106     Document Type: Article

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