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Physical Review B - Condensed Matter and Materials Physics

Volumn 79, Issue 12, 2009, Pages

Atomic processes during Cl supersaturation etching of Si (100) - (2×1)

(4) Aldao, C M a Agrawal, Abhishek a Butera, R E a Weaver, J H a

a University of Illinois at Urbana Champaign (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 63249129706 PISSN: 10980121 EISSN: 1550235X Source Type: Journal
DOI: 10.1103/PhysRevB.79.125303 Document Type: Article

Times cited : (18)

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