Dynamics of surface roughening of Cl-terminated Si(100)-(2×1) at 700 K

Physical Review B - Condensed Matter and Materials Physics

Volumn 67, Issue 12, 2003, Pages

  Xu, G J ^a   Graugnard, E ^a   Petrova, V ^a   Nakayama, Koji S ^a   Weaver, J H ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; SILICON DERIVATIVE;

ARTICLE; CONCENTRATION RESPONSE; DENSITY; DIFFUSION COEFFICIENT; IMAGE ANALYSIS; MOLECULAR DYNAMICS; PHASE TRANSITION; ROOM TEMPERATURE; SCANNING TUNNELING MICROSCOPY; SURFACE PROPERTY; TEMPERATURE DEPENDENCE;

EID: 0037881871     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.67.125320     Document Type: Article

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