A comprehensive atomistic kinetic monte carlo model for amorphization/recrystallization and its effects on dopants

Materials Research Society Symposium Proceedings

Volumn 1070, Issue , 2008, Pages 93-98

  Zographos, Nikolas ^a   Martin Bragado, Ignacio ^b  

^a SYNOPSYS SWITZERLAND LLC   (Switzerland)

^b SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; IONS; POINT DEFECTS; RECRYSTALLIZATION (METALLURGY);

ATOMISTIC MODELING; CALIBRATION METHODOLOGIES; DOPANT CONCENTRATIONS; DOPANT REDISTRIBUTION; END-OF-RANGE DEFECTS; ION-IMPLANTED DOPANTS; KINETIC MONTE CARLO MODEL; SOLID PHASE EPITAXIAL REGROWTH;

ACTIVATION ENERGY;

EID: 62949244045     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-1070-e03-01     Document Type: Conference Paper

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