International photomask linewidth comparison by NIST and PTB

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Potzick, J ^a   Dixson, R ^a   Quintanilha, R ^a   Stacker, M ^a   Vladar, A ^a   Buhr, E ^b   Hassler Grohne W ^b   Bodermann, B ^b   Frase, C G ^b   Bosse, H ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

CD metrology; International comparison; Linewidth; MRA; Nanol; Photomask; Uncertainty components

Indexed keywords

CD METROLOGY; INTERNATIONAL COMPARISON; MRA; NANOL; UNCERTAINTY COMPONENTS;

LINEWIDTH; MEASUREMENTS;

PHOTOMASKS;

EID: 62649169595     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801435     Document Type: Conference Paper

References (28)

1. http://www.bipm.org/en/cipm-mra/mra main text.html
2. J. Potzick, J. Nunn, "International Comparison of Photomask Linewidth Standards: United States (NIST) and United Kingdom (NPL)", Proceedings of the SPIE 1996 Annual Symposium on Microlithography, Vol. 2725-08, Santa Clara, Calif. (1996)
3. NIST SRM 2059 is available from the Office of Standard Reference Materials, NIST, EM 205, Gaithersburg, MD 20899. Voice 301-975-6776, FAX 301-948-3730.
4. Richter, J., et al: "Calibration of CD mask standards for the 65 nm mode: CoG and MoSi", EMLC 2007, 23rd European Mask and Lithography Conference EMLC, Proc. SPIE: 6533, (2007), 65330S-1-65330S-10
5. Guide to the expression of uncertainty in measurement, ISO, 1995, 110 p., ISBN 92-67-10188-9
6. Potzick, J., Pedulla, J.M., Stacker, M., "New NIST Photomask Linewidth Standard." Proceedings of BACUS Symposium on Photomask Technology, Vol. 4889-37 (2002)
7. F. Gans et al, "Results of a round robin measurement on a new CD mask standard", Proc. SPIE 5835 - 21st European Mask and Lithography Conference, 2005, 122-133
8. SEMI Standard P35-0704, Terminology for Microlithography Metrology, SEMI International Standards, 3081 Zanker Rd., San Jose, California 95134
9. J. Potzick, "Antireflecting-Chromium Linewidth Standard, SRM 473, for Calibration of Optical Microscope Linewidth Measuring Systems", NIST Special Publication SP-260-129 (1997)
10. J. Potzick, "Strut Structure and Rigid Joint Therefor," U.S. Patent 5,568,993 (1996).
11. R. Silver, J. Potzick, J. Hu, "Metrology with the Ultraviolet Scanning Transmission Microscope," Proceedings of the SPIE Symposium on Microlithography, Vol. 2439-46, Santa Clara, Calif, pp. 437-445 (1995).
12. August Köhler, "A new system of illumination for photomicrographic purposes," Mikroskopie, Vol. 10, pp. 433-440 (1893).
13. Mark Davidson, "Developments in optical modelling methods for metrology", SPIE Microlithography Conference, Metrology, Inspection and Process Control, vol. 3677, pp. 866-875 (1999)
14. E. Marx, "Integral Equation for Scattering by a Dielectric," IEEE Trans. Antennas Propagat. 32, 166-172 (1984)
15. Certain commercial equipment is identified in this work to adequately describe the experimental procedure. Such identification does not imply recommendation or endorsement by the NIST or PTB, nor does it imply that the equipment identified is necessarily the best available for the purpose.
16. Y. Martin, H. K. Wickramasinghe, "Method for imaging sidewalls by atomic force microscopy," Applied Physics Letters 64, 2498-2500(1994).
17. R. Dixson, J. Fu, N. Orji, W. Guthrie, R. Allen, M. Cresswell, "CD-AFM Reference Metrology at NIST and SEMATECH", SPIE Proceedings Vol. 5752, 324-336 (2005).
18. R. Dixson, A. Guerry, M. Bennett, T. Vorburger, B. Bunday, "Implementation of a Reference Measurement System using CD- AFM," SPIE Proceedings Vol. 5038, pp. 150-165 (2003)
19. R. Dixson, A. Guerry, M. Bennett, T. Vorburger, M. Postek, "Toward Traceability for At Line AFM Dimensional Metrology," SPIE Proceedings Vol. 4689, pp. 313-335 (2002)
20. see, for example,- J. Villarrubia, R. Dixson, S. Jones, J. R. Lowney, M. T. Postek, R. A. Allen, M. W. Cresswell, "Intercomparison of SEM, AFM, and electrical linewidths," SPIE Proceedings Vol. 3677, 587-440 (1999).
21. B. Bodermann, E. Buhr, W. Mirandé, "Quantitative Mikroskopie: Dimensionelle Messtechnik an Mikro- und Nanostrukturen", PTB Mitteilungen 113, 4, 9-17, (2003) (in German)
22. M. Totzeck, "Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields", Optik 112, 399-406(2001)
23. http://www.wias-berlin.de/software/DIPOG/index.html.en
24. http://www.icmwave.com/products.html
25. M. Wurm, B. Bodermann, F. Pilarski, "Metrology capabilities and performance of the new DUV scatterometer of the PTB," SPIE Proc. 6533-39,2007
26. W. Häßler-Grohne, H. Bosse, "Electron optical metrology system for pattern placement measurements", Meas. Sci. Technol. 9, 1120-1128(1998)
27. C. G. Frase, W. Häßler-Grohne, "Use of Monte Carlo Models in the Development and Validation of CD Operators," Surface and Interface Analysis, 37, 11, 942-950 (2005)
28. C. G. Frase, E. Buhr, K. Dirscherl, "CD characterization of nanostructures in SEM metrology," Meas. Sci. Technol. 18, 510-519 (2007)