Calibration of CD mask standards for the 65 nm node: CoG and MoSi

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6533, Issue , 2007, Pages

  Richter, J ^a   Heins, T ^a   Liebe, R ^a   Bodermann, B ^b   Diener, A ^b   Bergmann, D ^b   Frase, C G ^b   Bosse, H ^b  

^a Advanced Mask Technology Center (AMTC)   (Germany)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

CD metrology; CoG; MoSi; Photomask CD standard; SEM; Signal modelling; UV transmission microscopy

Indexed keywords

BINARY MASKS; MOSI; PHASE SHIFTING MASKS; SIGNAL MODELING; UV TRANSMISSION MICROSCOPY;

ATOMIC FORCE MICROSCOPY; LINEWIDTH; NANOSTRUCTURES; PHASE SHIFT; SCANNING ELECTRON MICROSCOPY;

PHOTOMASKS;

CALIBRATION; MASKING; ULTRAVIOLET MICROSCOPES;

EID: 35649027264     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.736931     Document Type: Conference Paper

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