Int. comparison of photomask linewidth standards: US (NIST) and United Kingdom (NPL)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 124-129

  Potzick, James E ^a   Nunn, John W ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOMASK LINEWIDTH; UNITED KINGDOM;

CALIBRATION; DISTANCE MEASUREMENT; MASKS; STANDARDS;

PHOTOLITHOGRAPHY;

EID: 0029749509     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)