Results of a round robin measurement on a new CD mask standard

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5835, Issue , 2005, Pages 122-133

  Gans, F ^a   Liebe, R ^a   Richter, J ^a   Schatz Th ^b   Hauffe, B ^c   Hillmann, F ^d   Dobereiner S ^d   Bruck H J ^d   Scheuring, G ^d   Brendel, B ^e   Bettin, L ^e   Roth K D ^f   Steinberg, W ^f   Schluter G ^f   Speckbacher, P ^g   Sedlmeier, W ^g   Scherubl T ^h   Hassler Grohne W ⁱ   Frase, C G ⁱ   Czerkas, S ⁱ   Dirscherl, K ⁱ   Bodermann, B ⁱ   Mirande W ⁱ   Bosse, H ⁱ   more..

^a AMTC   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

^c PHOTRONICS INC   (United States)

^d MueTec   (Germany)

^e Vistec Electron Beam GmbH   (Germany)

^f Leica Microsystems GmbH   (Germany)

^g Dr Johannes Heidenhain GmbH   (Germany)

^h CARL ZEISS SMT AG   (Germany)

ⁱ PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

CD metrology; Photomask standard; SEM; Signal modelling; UV transmission microscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; DATA ACQUISITION; MATHEMATICAL MODELS; PROJECT MANAGEMENT; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

CD METROLOGY; PHOTOMASK; SIGNAL MODELING; UV TRANSMISSION SPECTROSCOPY;

CODES (STANDARDS);

EID: 27744442740     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.637313     Document Type: Conference Paper

References (17)

1. Schätz, Th. et al: "Development and characterization of new CD mask standard: a status report" Proc. 19th EMC, GMM-Fachbericht 39, 37-45, 2003
2. F. Hillmann et al: "DUV Water Immersion Technology Extends Linearity, First Results from the new 65nm Node CD Metrology System LWM500 WI", Proc. EMLC 2005, Dresden, this conference
3. SEMI standard, SEMI P43-0304 - Photomask Qualification Terminology, www.semi.org
4. B. Bodermann, E. Buhr, W. Mirandé: "Quantitative Mikroskopie: Dimensionelle Messtechnik an Mikro- und Nanostrukturen", PTB Mitteilungen 113, 4, 9-17 (2003) (in German)
5. M. G. Moharam, E. B. Grann, D. A. Pommet, T. K. Gaylord: "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings", JOSA A 12, (1995), 1068-1076
6. M. G. Moharam, E. B. Grann, D. A. Pommet, T. K. Gaylord: "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach", JOSA A 12, (1995), 1077-1086
7. P. Lalanne, G. M. Morris: "Highly improved convergence of the coupled-wave method for TM-polarizastion", JOSA A 13, (1996), 779-784
8. M. Totzeck: "Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields", Optik 112, (2001), 399-406
9. ISO 1993 Guide to the Expression of Uncertainty in Measurement (Published by the ISO in the name of the BIPM, IEC, IFCC, IUPAC, IUPAP and OIML (Geneva))
10. W. Mirande et al: "Characterization of new CD photomask standards", Proc. SPIE Microlithography, Vol. 5375, p. 29-40, 2004
11. J. Potzick, National Institute of Science and Technology, NIST: private communication
12. J. Potzick et al, "New NIST Photomask Linewidth Standard", Proc. SPIE, Vol. 4889, 2002
13. W. Häßler-Grohne, H. Bosse, "Electron optical metrology system for pattern placement measurements", Meas. Sci. Technol. 9, 1120-1128 (1998)
14. L. Reimer, M. Kässens, L. Wiese, "Monte Carlo Program with free Configuration of Specimen Geometry and Detector Signals", Microchim. Acta 13, pp.485-492 (1996)
15. W. Mirandé, C.G. Frase, "Comparison of Linewidth Measurements on Si Structures performed by Atomic Force Microscopy (AFM) and low Voltage Scanning Electron Microscopy (SEM)", Proceedings Quantitative Microscopy (QM'99), Kopenhagen, 1999, PTB-Bericht PTB-F-34, 89-96 (1999)
16. W. Häßler-Grohne, C.G. Frase, K. Hahm, H. Bosse: Analysis and comparison of CD-SEM edge operators: a contribution to feature width metrology, Conf. Proc. Nanoscale 2004, Braunschweig
17. A. Karabekov, O. Zoran, Z. Rosenberg, G. Eytan, "Using Monte Carlo Simulation for Accurate Critical Dimension Metrology of Super Small Isolated Poly-Lines", SCANNING 25, 291-296 (2003)