Developments in optical modeling methods for metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue II, 1999, Pages 866-875

  Davidson, Mark P ^a  

^a Spectel Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; APPROXIMATION THEORY; COMPUTER SIMULATION; DIFFRACTION GRATINGS; LITHOGRAPHY;

OPTICAL ALIGNMENT MODELING;

OPTICAL MICROSCOPY;

EID: 0032662550     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350875     Document Type: Conference Paper

References (7)