Sonoluminescence helps in design of megasonic cleaning system

Semiconductor International

Volumn 28, Issue 1, 2005, Pages 40-

  Engesser, P ^a   Ferrell, G ^a   Gleissner, A ^a   Klitzke, J ^a   Koffler M ^a   Kumnig, F ^a   Lippert A ^a   Obweger, R ^a   Pfeuffer, A ^a   Sax, H ^a   Okorn Schmidt, H ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); CONTAMINATION; DETECTORS; ELEMENTARY PARTICLES; PHOTONS; REMOVAL; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SOLUTIONS; THERMAL EFFECTS; THREE DIMENSIONAL;

MEGASONICS; MULTI-BUBBLE-SONOLUMINESCENCE (MBSL); PARTICLE REMOVAL EFFICIENCY (PRE); POLYLINE WAFERS;

SONOLUMINESCENCE;

EID: 18144430210     PISSN: 01633767     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Note

References (2)

1. F. Holsteyns, A. Riskin, G. Vereecke, A. Maes and P.M. Mertens, Electrochemical Society PV 9003-26.
2. G.W. Ferrell and L.A. Crum, J. Acoust. Soc. Am., Vol. 112. No. 3, Pt. 1, September 2002.