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Volumn 28, Issue 1, 2005, Pages 38-44
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Damage-free cleaning beyond 65 nm
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
BOUNDARY LAYERS;
CLEANING;
ELEMENTARY PARTICLES;
OXIDATION;
PHOTORESISTORS;
POLYSILICON;
POROUS MATERIALS;
REMOVAL;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICON ON INSULATOR TECHNOLOGY;
SURFACE ROUGHNESS;
THIN FILMS;
TRANSDUCERS;
BACK-END-OF-LINE (BEOL);
FRONT-END-OF-LINE (FEOL);
MEGASONICS;
POLYGATE STRUCTURING;
SILICON WAFERS;
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EID: 18144420369
PISSN: 01633767
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Review |
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Times cited : (10)
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References (0)
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