Acoustic streaming effects in megasonic cleaning of EUV photomasks: A continuum model

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Kapila, Vivek ^a   Deymier, Pierre A ^a   Shende, Hrishikesh ^a   Pandit, Viraj ^a   Raghavan, Srini ^a   Eschbach, Florence O ^b  

^a University of Arizona   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Acoustic streaming; Euv lithography; Megasonic cleaning

Indexed keywords

EUV LITHOGRAPHY; MEGASONIC CLEANING; MEGASONIC WAVES; SUBSTRATE/FLUID INTERFACE;

ACOUSTIC STREAMING; CONTINUUM MECHANICS; INTERFACES (MATERIALS); PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

MASKS;

EID: 33644602148     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.633378     Document Type: Conference Paper

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